PLASTIC GRINDING PADS FOR NANO TECHNOLOGY POLISHING MACHINES USED IN THE PRODUCTION OF CERAMIC TILES AND BUFFER DISCS SIZE: 180X40MM (+/-10MM) SIZE: 180X40MM MANUFACTURER: NEWWAY 100% NEW
PLASTIC GRINDING PADS FOR NANO TECHNOLOGY POLISHING MACHINES USED IN THE PRODUCTION OF CERAMIC TILES AND BUFFER DISCS SIZE: 180X40MM (+/-10MM) SIZE: 180X40MM MANUFACTURER: NEWWAY 100% NEW
PLASTIC GRINDING PAD USED FOR NANO TECHNOLOGY POLISHING MACHINES USED IN THE PRODUCTION OF CERAMIC TILES AND FOAM DISCS SIZE: 180X50MM (+/-10MM) MH: M 180X50MM MANUFACTURER: NEWWAY 100% NEW
PLASTIC GRINDING PAD USED FOR NANO TECHNOLOGY POLISHING MACHINES USED IN THE PRODUCTION OF CERAMIC TILES AND FOAM DISCS SIZE: 180X50MM (+/-10MM) MH: M 180X50MM MANUFACTURER: NEWWAY 100% NEW
23-November-2023
5911901000
PADS OF TECHNICAL FABRIC EXTERMINED WITH FOAM PLASTIC USED TO PADD ELECTRONIC COMPONENTS SIZE: 2.0*2.1T*84.2MM MANUFACTURER; NANOINTERFACE INC CODE: X2745-875-09987-A SAMPLE 100% NEW
PADS OF TECHNICAL FABRIC EXTERMINED WITH FOAM PLASTIC USED TO PADD ELECTRONIC COMPONENTS SIZE: 2.0*2.1T*84.2MM MANUFACTURER; NANOINTERFACE INC CODE: X2745-875-09987-A SAMPLE 100% NEW
23-November-2023
5911901000
PADS OF TECHNICAL FABRIC LAMINATED WITH FOAM PLASTIC USED TO PADD ELECTRONIC COMPONENTS SIZE: 2.0*2.1T*75.1MM MANUFACTURER; NANOINTERFACE INC CODE: X2745-875-09988-A SAMPLE 100% NEW
PADS OF TECHNICAL FABRIC LAMINATED WITH FOAM PLASTIC USED TO PADD ELECTRONIC COMPONENTS SIZE: 2.0*2.1T*75.1MM MANUFACTURER; NANOINTERFACE INC CODE: X2745-875-09988-A SAMPLE 100% NEW
16-December-2023
8541290000
AMT177#&TRANSISTOR 64-000219AA/AMT5710 LED PAD/NANOCELL LMS T2.0 +TAPE T0.05 ARE MATERIALS FOR PRODUCING ELECTROMAGNETIC CIRCUIT BOARDS. NEW 100%
AMT177#&TRANSISTOR 64-000219AA/AMT5710 LED PAD/NANOCELL LMS T2.0 +TAPE T0.05 ARE MATERIALS FOR PRODUCING ELECTROMAGNETIC CIRCUIT BOARDS. NEW 100%